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Nanolithography is essentially a patterning technique in which structures (e.g., arrays of nanoholes) of user-defined designs are produced at the surface of solid substrates such as metals, semiconductors, glass materials, and polymers. The lateral and vertical dimensions of the nanoholes are usually controlled post-patterning by an etching treatment (to increase the hole size) or a deposition treatment (to decrease the hole size by coating its sidewalls). Nanolithography constitutes a set of lithography techniques of which most routinely used are photolithography, electron beam lithography, and soft lithography. This forum discusses various nanolithography techniques known to date.